Tokyo, Japan

Toshikatsu Ueda

This inventor holds 1 USPTO granted patent. Top assignee: Shinryo Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikatsu Ueda. Retrieved from https://idiyas.com/inventor/toshikatsu-ueda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshikatsu Ueda in Antigen Exposure Technology.

Introduction

Toshikatsu Ueda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of antigen exposure technology. His innovative approach addresses the limitations of conventional antigen exposure chambers.

Latest Patents

Ueda holds a patent for an "Antigen exposure chamber system." This invention aims to solve the problems associated with traditional antigen exposure chambers. The system allows for the simultaneous exposure of a large number of test objects to a uniform antigen, such as pollen, mites, or house dust, throughout all seasons. The design includes an outdoor air diffuser, fan units for air circulation, and an antigen supply device to ensure a consistent concentration of the antigen.

Career Highlights

Toshikatsu Ueda is associated with Shinryo Corporation, where he applies his expertise in developing advanced exposure systems. His work has been instrumental in enhancing the efficiency and effectiveness of antigen exposure methodologies.

Collaborations

Ueda collaborates with notable colleagues, including Minoru Okuda and Kimihiro Okubo. Their combined efforts contribute to the advancement of research and development in this specialized field.

Conclusion

Toshikatsu Ueda's innovative contributions to antigen exposure technology reflect his commitment to improving scientific methodologies. His patent for the antigen exposure chamber system showcases his ability to address complex challenges in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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