Location History:
- Kanagawa, JP (2001)
- Shizuoka, JP (2002)
- Odawara, JP (2003 - 2006)
Company Filing History:
Years Active: 2001-2006
Title: Innovations by Toshihiro Mandai
Introduction
Toshihiro Mandai is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of coating technology, holding a total of 12 patents. His work focuses on methods and apparatuses that enhance the efficiency and quality of coating processes.
Latest Patents
Among his latest innovations is a coating method and apparatus that allows for the reuse of coating liquid without the need for fluid adjusting or filtering treatments. This technology maintains the advantages of a scraping-off type of extrusion coater, which is essential for achieving a uniform and extremely thin coating film. The apparatus features two slits: a coating slit and a recovering slit. The excessive coating liquid discharged through the coating slit is scraped off and recovered through the recovering slit. Another significant patent involves optimizing the slit clearance of both the coating slit and the recovering slit to produce a coating layer with a very small and even thickness. This innovation allows for precise application of the desired amount of coating liquid by scraping off the excess.
Career Highlights
Toshihiro Mandai is currently associated with Fuji Photo Film Company, Limited, where he continues to develop innovative solutions in coating technology. His expertise has led to advancements that benefit various applications in the industry.
Collaborations
He has collaborated with notable coworkers, including Mikio Tomaru and Norio Shibata, contributing to the development of cutting-edge technologies in their field.
Conclusion
Toshihiro Mandai's contributions to coating technology exemplify the impact of innovation in enhancing industrial processes. His patents reflect a commitment to improving efficiency and quality in coating applications.