The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Feb. 19, 2003
Applicants:
Toshihiro Mandai, Odawara, JP;
Mikio Tomaru, Odawara, JP;
Norio Shibata, Odawara, JP;
Inventors:
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
In coating with two slits of a coating slit and a recovering slit, by optimizing the slit clearance of the coating slit and the recovering slit, a coating layer with a very small and even thickness can be obtained. In a coating apparatus in which after a coating liquid is applied to a web to excess through the coating slit, a desired amount of coating liquid is applied to the web by scraping off an excess of coating liquid with a recovering slit, there is provided a slit clearance adjusting device for adjusting the slit clearance of the recovering slit.