Company Filing History:
2 out of 832,966 Years Active: 2002
Title: Innovations by Toshihiro Ii
Introduction
Toshihiro Ii is a notable inventor based in Miyagi-ken, Japan. He has made significant contributions to the field of semiconductor cleaning processes, holding a total of 2 patents. His work focuses on improving cleaning methods and apparatuses that utilize ultra-pure water and hydrogen gas.
Latest Patents
Toshihiro Ii's latest patents include a wet cleaning apparatus that utilizes ultra-pure water rinse liquid with hydrogen gas. This innovative apparatus is designed to remove trace heavy metals, colloidal matter, and other impurities from ultra-pure water used in semiconductor cleaning processes. It effectively suppresses the deposition of trace impurities that could otherwise deteriorate the characteristics of semiconductor devices. The apparatus features a rinse location where ultra-pure water is supplied through piping, and it includes a module filled with porous film containing polymer chains with various exchange groups. Additionally, the apparatus incorporates a means for adding hydrogen gas to the rinse liquid.
Another significant patent is a cleaning method that operates at room temperature without the need for heating. This method uses minimal chemicals and water, eliminating the requirement for special devices or materials. The cleaning processes employ pure or ultra-pure water, which helps suppress the formation of surface oxide films, removes particles, and prevents their redeposition. The method includes cleaning with pure water containing ozone and using a cleaning liquid with HF and surfactants while applying high-frequency vibrations.
Career Highlights
Toshihiro Ii has dedicated his career to advancing cleaning technologies in the semiconductor industry. His innovative approaches have led to more efficient and environmentally friendly cleaning methods. His patents reflect a commitment to improving the quality and reliability of semiconductor devices.
Collaborations
Toshihiro Ii has collaborated with notable colleagues such as Tadahiro Ohmi and Kazuhiko Kawada. These partnerships have contributed to the development of his innovative cleaning technologies.
Conclusion
Toshihiro Ii's contributions to the field of semiconductor cleaning processes demonstrate his expertise and commitment to innovation. His patents highlight the importance of developing efficient and effective cleaning methods that enhance the performance of semiconductor devices.