Toshihiro Hatori

Toshihiro Hatori is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in the development of shadow masks for cathode ray tubes. With a total of 3 patents to his name, Hatori's work has had a lasting impact on the industry.

Latest Patents

Hatori's latest patents include innovative designs that enhance the functionality of shadow masks. One of his patents describes a shadow mask having a slot structure that permits electron beams to enter at increased angles. This design features a large number of slots arranged in both horizontal and vertical directions, allowing for improved electron beam entry. Another patent focuses on a slot tension-type shadow mask for cathode ray tubes, which includes slots with pseudo-bridges that provide effective shielding and address issues related to heating and image imperfections on CRT screens.

Career Highlights

Hatori is currently employed at Dai Nippon Printing Co., Ltd., where he continues to push the boundaries of technology through his innovative designs. His work has been instrumental in advancing the capabilities of cathode ray tubes, which have been widely used in various electronic devices.

Collaborations

Throughout his career, Hatori has collaborated with talented individuals such as Hirofumi Hideshima and Takeshi Ikegami. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Toshihiro Hatori's contributions to the field of technology, particularly in the area of shadow masks, demonstrate his innovative spirit and dedication to advancing electronic design. His patents reflect a commitment to improving the performance and efficiency of cathode ray tubes, solidifying his place as a significant figure in the industry.