Kanagawa, Japan

Toshihiko Sawada



Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Toshihiko Sawada

Introduction: Toshihiko Sawada, a distinguished inventor based in Kanagawa, Japan, has made significant contributions to the field of chemistry with his innovative work on thiopyranose compounds. Holding a single patent, his contributions underscore the importance of focused research and development in modern scientific endeavors.

Latest Patents: Toshihiko Sawada's notable patent involves a thiopyranose compound and the method for producing the same. The described method details a reaction between a compound represented by a specific formula and a sulfur compound, where elements such as X (a leaving group) and A (either an oxygen or sulfur atom) play crucial roles. The patent also indicates how each variable Rto R, Rto R, and R represents a hydrogen atom or a specific substituent, highlighting the complexity and specificity of his invention.

Career Highlights: Currently, Toshihiko Sawada is affiliated with Fujifilm Corporation, a prominent player in the field of imaging and information technology. His career there has allowed him to delve deeper into the intricacies of chemical research, leading to the development of his patented thiopyranose compound.

Collaborations: Throughout his career, Toshihiko Sawada has worked alongside notable colleagues, such as Akira Takeda and Toru Watanabe. These collaborative efforts not only reflect a dedicated teamwork spirit but also showcase the collective pursuit of innovation within Fujifilm Corporation.

Conclusion: In summary, Toshihiko Sawada's work represents a prime example of how focused innovation can lead to the development of valuable intellectual property. His patent on thiopyranose compounds is a testament to his capability as an inventor and his contribution to the scientific community. As he continues to work at Fujifilm Corporation, his ongoing research may pave the way for further advancements in chemical applications.

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