Osaka, Japan

Toshihiko Ohta

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Daikin Industries, Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihiko Ohta. Retrieved from https://idiyas.com/inventor/toshihiko-ohta-7soeuk3m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshihiko Ohta in Fluorine Chemistry

Introduction

Toshihiko Ohta is a prominent inventor based in Osaka, Japan. He is known for his significant contributions to the field of fluorine chemistry. His innovative work has led to advancements in the production of important fluorinated compounds.

Latest Patents

One of Toshihiko Ohta's notable patents is a method for producing tetrafluoroethylene and/or hexafluoropropylene. This process involves pyrolyzing a low molecular weight fluorine compound through continuous reaction in a microreactor. This innovative approach enhances the efficiency of producing these valuable chemicals.

Career Highlights

Toshihiko Ohta is associated with Daikin Industries, Ltd., a leading company in the field of fluorine products. His work at Daikin has allowed him to focus on developing advanced methods for producing fluorinated compounds, which are essential in various industrial applications.

Collaborations

Toshihiko Ohta has collaborated with notable colleagues, including Hideki Nakaya and Mai Hirai. Their teamwork has contributed to the successful development of innovative processes in the field of fluorine chemistry.

Conclusion

Toshihiko Ohta's contributions to the field of fluorine chemistry, particularly through his patented methods, highlight his role as a key innovator in the industry. His work continues to influence the production of essential fluorinated compounds.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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