Location History:
- Fukushima-ken, JP (2001)
- Gunma-ken, JP (2003)
Company Filing History:
Years Active: 2001-2003
Title: **Toshihiko Miyano: Innovator in Silicon Wafer Heat Treatment**
Introduction
Toshihiko Miyano is a notable inventor based in Gunma-ken, Japan, recognized for his contributions to the field of semiconductor technology. With a total of two patents to his name, he has significantly advanced methods for the heat treatment of silicon wafers, an essential process in the manufacturing of electronic devices.
Latest Patents
Miyano's latest patents include a groundbreaking method for heat treatment of silicon wafers, which utilizes a rapid thermal annealer (RTA) in a reducing atmosphere. This innovative technique involves heating the silicon wafer at a temperature ranging from 1150°C to 1300°C for a duration of 1 to 60 seconds in a mixture of hydrogen and argon. The method notably decreases the COP density on the surface of the wafer, thereby enhancing electrical characteristics like TZDB and TDDB. Moreover, it minimizes slip dislocation generation, reducing the likelihood of wafer breakage, while also improving productivity and decreasing hydrogen gas usage. An additional aspect of his patents reveals a multi-step heat treatment process that can be executed continuously within the RTA apparatus, further enhancing the wafer's surface qualities such as microroughness and haze.
Career Highlights
Miyano is associated with Shin-Etsu Handotai Co., Ltd., a prominent player in the semiconductor industry, where he has applied his expertise to pioneer methods that improve silicon wafer performance. His dedication to advancing semiconductor manufacturing processes has positioned him as a key inventor in this field.
Collaborations
Throughout his career, Toshihiko Miyano has collaborated with talented individuals like Norihiro Kobayashi and Shoji Akiyama. Their combined efforts have fostered innovative solutions that drive the advancement of semiconductor technology and enhance the quality of silicon wafers used in various applications.
Conclusion
In conclusion, Toshihiko Miyano's contributions to the heat treatment of silicon wafers demonstrate the importance of innovation in the semiconductor industry. His patents not only improve electrical characteristics but also enhance the efficiency of the manufacturing process. As he continues to make strides in his career, his work remains instrumental in shaping the future of semiconductor technology.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.