This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: The Innovations of Toshihiko Kohno
Introduction
Toshihiko Kohno is a prominent inventor based in Kokubunji, Japan. He is known for his significant contributions to the field of electron beam lithography. His innovative work has led to advancements that enhance the efficiency of pattern data generation in lithography systems.
Latest Patents
Kohno holds a patent for an electron beam lithography system. This system generates phase shift pattern data related to main patterns and exposes the phase shift pattern on a mask plate using an electron beam, guided by computer instructions. The invention notably reduces the time required for preparing phase shift pattern data. The apparatus includes a parameter table that stores equations for generating this data, allowing for automatic exposure of the phase shift pattern.
Career Highlights
Kohno is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to focus on developing advanced lithography systems that are crucial for various applications in semiconductor manufacturing.
Collaborations
Kohno has collaborated with notable colleagues such as Takashi Matsuzaka and Katsuhiro Kawasaki. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Toshihiko Kohno's contributions to electron beam lithography exemplify the impact of innovative thinking in technology. His patent reflects a significant advancement in the field, showcasing his dedication to improving efficiency in lithography systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile