Kurokawa, Japan

Toshihiko Kikuchi

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihiko Kikuchi. Retrieved from https://idiyas.com/inventor/toshihiko-kikuchi-81plpw65

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Toshihiko Kikuchi: Innovator in Film Thickness Measurement

Introduction

Toshihiko Kikuchi is a notable inventor based in Kurokawa, Japan. He has made significant contributions to the field of film thickness measurement, showcasing his expertise through his innovative patent.

Latest Patents

Kikuchi holds a patent for a film thickness measuring method. This method involves projecting white light onto a wafer with a film to be measured and sensing the first reflected light intensity from the wafer. The process includes determining the first reflected light intensity in the form of a first light intensity profile, projecting the white light onto a reference sample, and calculating the film thickness from the normalized light intensity profile. This innovative approach enhances the accuracy of film thickness measurements in various applications.

Career Highlights

Kikuchi is associated with Kabushiki Kaisha Toshiba, a prominent company known for its technological advancements. His work at Toshiba has allowed him to develop and refine his methods, contributing to the company's reputation for innovation.

Collaborations

Kikuchi collaborates with Toru Mikami, a fellow innovator, to further enhance their research and development efforts in the field of film measurement technologies.

Conclusion

Toshihiko Kikuchi's contributions to film thickness measurement demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in the precision of measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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