Company Filing History:
Years Active: 2014-2019
Title: Innovations of Toshihide Takashima
Introduction
Toshihide Takashima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing, holding two patents that showcase his innovative approaches. His work is primarily associated with Tokyo Electron Limited, a leading company in the semiconductor industry.
Latest Patents
Takashima's latest patents include a method and apparatus for substrate processing. This method involves bringing a removal solution, which is a mixture of nitric acid, a stronger acid, and water, into contact with a substrate that has a boron monofilm. This process effectively removes the boron monofilm from the substrate. Another patent focuses on a substrate processing apparatus and method that utilizes SPM liquid, a mixture of sulfuric acid and hydrogen peroxide, to remove contaminants from a substrate. This invention includes a heating unit to maintain the SPM liquid at a specific temperature range, ensuring optimal performance while preventing degradation of its contaminant removal capabilities.
Career Highlights
Throughout his career, Takashima has demonstrated a commitment to advancing substrate processing technologies. His work has contributed to the efficiency and effectiveness of semiconductor manufacturing processes. His innovative solutions have positioned him as a key figure in the industry.
Collaborations
Takashima has collaborated with notable colleagues, including Koji Kagawa and Syuhei Yonezawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Toshihide Takashima's contributions to substrate processing through his patents reflect his innovative spirit and dedication to the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.