Toshiharu Matsueda

Title: Toshiharu Matsueda: Innovator in Semiconductor Doping Technology

Introduction

Toshiharu Matsueda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of doping materials. His innovative approach has led to advancements that benefit the semiconductor industry.

Latest Patents

Matsueda holds a patent for a "Dopant of arsenic, method for the preparation thereof and method for." This patent describes a dopant body of arsenic designed for doping semiconductor substrates, such as silicon wafers. The dopant body is a sintered mixture of silicon arsenide, silica, and optionally, arsenic oxide. This method offers various advantages over traditional arsenic powder, including enhanced mechanical strength and reduced environmental contamination risks.

Career Highlights

Throughout his career, Matsueda has worked with prominent companies in the semiconductor industry, including Furukawa Co., Ltd. and Shin-Etsu Chemical Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to significant advancements in semiconductor doping technologies.

Collaborations

Matsueda has collaborated with esteemed colleagues such as Shigeaki Saito and Yoshihiro Kubota. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Toshiharu Matsueda's contributions to semiconductor doping technology highlight his role as an influential inventor. His patented innovations continue to impact the industry positively, showcasing the importance of research and development in advancing technology.