Otokuni-gun, Japan

Toshiharu Goto

This inventor holds 2 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignee: Maxell, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiharu Goto. Retrieved from https://idiyas.com/inventor/toshiharu-goto-bahete6n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Toshiharu Goto and Co-Extruded Sheet Innovation.

Introduction

Toshiharu Goto is an inventor associated with Maxell, Ltd., in Otokuni-gun, Japan. His listed patent concerns a co-extruded sheet designed to improve performance during thermal shaping.

Latest Patents

Goto is credited with 1 patent: “Co-extruded sheet.” The invention uses a foam-resin core layer between non-foaming resin skin layers and contains polycarbonate resin. Its design aims to reduce surface swelling and cracking during processes such as vacuum forming while improving mechanical strength. The sheet is specified to have a density of 0.4 to 0.9 g/cm³ and a thickness of 1 to 5 mm, with the combined skin-layer thicknesses making up 0.10 to 0.5 of the total sheet thickness.

Career Highlights

Goto’s listed work connects his inventive activity with Maxell, Ltd. The co-extruded sheet patent addresses material structure and durability in thermal shaping applications.

Collaborations

Satoki Taniguchi is identified as Goto’s coworker. The available information does not specify their roles in developing the patented sheet.

Conclusion

Toshiharu Goto’s listed patent presents a layered polycarbonate-containing sheet intended to resist surface defects and provide improved mechanical strength during thermal shaping.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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