Company Filing History:
Years Active: 1995
Title: Innovations of Toshiharu Aono
Introduction
Toshiharu Aono is a notable inventor based in Yokohamashi, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced polymer films. His work focuses on enhancing the properties of polyimidesiloxane films, which are crucial for various industrial applications.
Latest Patents
Aono holds a patent for a polyimidesiloxane film characterized by low heat conductivity. This innovative film maintains the intrinsic heat resistance of polyimide while exhibiting high hardness and superior adherence to substrates. The film comprises a cross-linked copolymer with specific repetition units, achieving a heat resistance of 511°C or higher, a hardness of 3H or higher, and a heat conductivity of 0.160 or lower. This patent highlights Aono's expertise in creating materials that meet demanding performance criteria.
Career Highlights
Aono is currently associated with Chisso Corporation, where he continues to push the boundaries of material innovation. His work has not only contributed to the company's portfolio but has also advanced the field of polymer science. With a focus on practical applications, Aono's inventions are paving the way for new technologies.
Collaborations
Aono collaborates with Kouichi Kunimune, a fellow innovator in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements and achieving groundbreaking results.
Conclusion
Toshiharu Aono's contributions to the field of materials science, particularly through his patented polyimidesiloxane film, demonstrate his commitment to innovation. His work at Chisso Corporation and collaborations with other inventors continue to influence the industry positively.