Tokyo, Japan

Toshifumi Kitahara

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Tokyo, JP (2022)
  • Fuchu, JP (2024)

Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Toshifumi Kitahara: Innovator in Plasma Processing Technology

Introduction

Toshifumi Kitahara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of four patents. His innovative work has advanced the capabilities of plasma processing apparatuses, which are essential in various industrial applications.

Latest Patents

Among his latest patents, Toshifumi Kitahara has developed a plasma processing apparatus and a plasma processing method. The first patent describes a plasma processing apparatus that includes a stage within a processing container and an upper electrode. This upper electrode features a dielectric plate facing the stage, with a conductor formed on the opposite surface. The dielectric plate is designed with a central portion, an outer peripheral portion, and an intermediate portion that has a greater thickness than the other sections.

The second patent also focuses on a plasma processing apparatus, which consists of a coaxial tube extending vertically and forming part of a radio frequency waveguide. This apparatus includes a substrate support, an electrode with a gas flow path, and dielectric tubes made of a dielectric material. These tubes are strategically placed to supply gas to the electrode, enhancing the efficiency of the plasma processing.

Career Highlights

Toshifumi Kitahara has worked with notable companies in the technology sector, including Tokyo Electron Limited and Sinfonia Technology Co., Ltd. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to significant advancements in the field.

Collaborations

Throughout his career, Toshifumi has collaborated with talented individuals such as Taro Ikeda and Satoru Kawakami. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Toshifumi Kitahara's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in industrial applications, showcasing the importance of innovation in technology.

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