This inventor holds 2 USPTO granted patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2015-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015-2016
Title: Toshiaki Satou: Innovator in Anti-Reflection Technology
Introduction
Toshiaki Satou is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of anti-reflection technology, holding 2 patents that showcase his innovative approach to manufacturing anti-reflection articles.
Latest Patents
Satou's latest patents focus on the development of an inexpensive anti-reflection article. This invention utilizes a manufacturing mold plate that is produced at a low cost while providing sufficient anti-reflection properties. The method involves molding an uneven shape on a receptive layer by applying pressure from an anti-reflection surface of another article. This process ensures that the gap between adjacent minute convex or concave portions is minimized, enhancing the anti-reflection capabilities. Additionally, his patents describe an anti-reflection article that features densely arranged minute concave portions, which are designed to improve abrasion resistance compared to previous models.
Career Highlights
Toshiaki Satou is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in advancing anti-reflection technologies. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the field of optical innovations.
Collaborations
Throughout his career, Satou has collaborated with notable colleagues, including Hironori Kamiyama and Minoru Yamamoto. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Toshiaki Satou's contributions to anti-reflection technology exemplify his innovative spirit and dedication to improving optical materials. His patents reflect a commitment to advancing manufacturing processes and enhancing product performance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile