Akishima, Japan

Toshiaki Nagahama


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2000-2004

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5 patents (USPTO):Explore Patents

Title: Toshiaki Nagahama: Innovator in Semiconductor Manufacturing

Introduction

Toshiaki Nagahama is a distinguished inventor based in Akishima, Japan, known for his significant contributions to the field of semiconductor technology. With a portfolio of five patents, Nagahama's work focuses on improving the processes involved in manufacturing semiconductor integrated circuit devices.

Latest Patents

Among his notable inventions, Nagahama's latest patents include a pioneering process for manufacturing semiconductor integrated circuit devices that addresses the treatment of gases used during production. This innovative technique involves a gas-phase treating process of a semiconductor wafer using hydrogen. It provides a method for the safe elimination of hydrogen in exhaust gas from gas-phase treating apparatuses. Notably, the profile at the end portions of the gate electrodes of a poly-metal structure is enhanced by forming these electrodes over a semiconductor wafer that has a gate oxide film. Subsequently, hydrogen gas with a low concentration of water, generated through catalytic action from hydrogen and oxygen, oxidizes the surface of the semiconductor wafer selectively. The process concludes with the complete conversion of hydrogen in the exhaust gas—discharged from an oxidizing furnace—into water by catalytically reacting it with oxygen.

Career Highlights

Toshiaki Nagahama has had an impressive career, contributing to leading companies in the semiconductor industry, including Hitachi, Ltd. His expertise and innovative mindset have positioned him as a valuable asset in the field, enabling advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Nagahama has collaborated with esteemed professionals in the industry, such as Yoshikazu Tanabe and Nobuyoshi Natsuaki. These collaborations have fostered an environment of innovation, facilitating the development and refinement of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Toshiaki Nagahama's work exemplifies the spirit of innovation that drives advancements in technology. With his valuable patents and collaborative efforts in the semiconductor industry, Nagahama continues to pave the way for future developments, ensuring a safer and more efficient manufacturing process. His contributions are a testament to the impact that dedicated inventors can have on the world of technology.

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