Komagane, Japan

Toshiaki Kimura

This inventor holds 3 USPTO granted patents. Top assignees: Nhk Spring Co., Ltd., Asahi Kasei Kabushiki Kaisha. Active years: 1981-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaki Kimura. Retrieved from https://idiyas.com/inventor/toshiaki-kimura-9at500qf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 145(Granted Patents)


Location History:

  • Yokohama, JP (1981)
  • Kamiina-gun, JP (2004)
  • Komagane, JP (2010)

Company Filing History:


Years Active: 1981-2010

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3 patents (USPTO):Explore Patents

Title: Toshiaki Kimura: Innovator in Polishing and Printing Technologies

Introduction

Toshiaki Kimura is a notable inventor based in Komagane, Japan. He has made significant contributions to the fields of polishing materials and printing technologies. With a total of 3 patents to his name, Kimura's work reflects a commitment to innovation and practical applications.

Latest Patents

One of Kimura's latest patents is a cushioning material for a polishing pad. This innovative material is designed to minimize swelling deformation caused by water, thanks to its extremely low water-absorbing characteristics. The cushioning material includes a polyurethane foam that can effectively polish semiconductor wafers, even those with undulated surfaces or local steps formed during the circuit formation process. The polyurethane foam is characterized by a contact angle with water of 90° or more, and it is preferably made using hydrophobic polyol, which enhances its performance.

Another significant patent is for a low-cost flexographic printing plate. This printing plate eliminates the need for conventional tackiness tape or tacky-elastic foam during mounting on a printing press. It is designed for repeated use and high-accuracy printing. The flexographic printing plate comprises a photo-curable resin layer, a support layer with barrier performance, an adhesive layer, and an elastic layer. The outer surface of the elastic layer features a rereleasable tacky surface, making it a versatile solution for printing needs.

Career Highlights

Throughout his career, Toshiaki Kimura has worked with prominent companies such as NHK Spring Co., Ltd. and Asahi Kasei Corporation. His experience in these organizations has contributed to his expertise in developing innovative materials and technologies.

Collaborations

Kimura has collaborated with notable coworkers, including Koichi Kusakawa and Takao Maruyama. Their combined efforts have likely fostered an environment of creativity and innovation in their respective fields.

Conclusion

Toshiaki Kimura's contributions to polishing and printing technologies demonstrate his innovative spirit and dedication to advancing these industries. His patents reflect a deep understanding of material science and practical applications, making him a significant figure in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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