Toyama, Japan

Toshiaki Ichii

This inventor holds 1 USPTO granted patent. Top assignee: Hokuriku Electric Industry Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaki Ichii. Retrieved from https://idiyas.com/inventor/toshiaki-ichii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Toshiaki Ichii: Innovator in Pressure Sensor Technology

Introduction

Toshiaki Ichii is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of pressure sensor technology. His innovative work focuses on enhancing the performance and reliability of pressure sensors.

Latest Patents

Ichii holds a patent for a "Measurement fluctuation suppressing pressure sensor device." This device is designed to provide excellent temperature characteristics. It features an auxiliary fluid introduction path in the bottom wall of a first case. This path allows fluid to be introduced near a recessed portion where an integrated circuit is mounted. The design ensures that the temperature of the integrated circuit aligns closely with that of the fluid, thereby improving its performance.

Career Highlights

Toshiaki Ichii is associated with Hokuriku Electric Industry Co., Ltd. His work at the company has been instrumental in advancing pressure sensor technology. He has demonstrated a commitment to innovation and quality in his field.

Collaborations

Ichii collaborates with Hiroyuki Sawamura, a fellow innovator. Their partnership has contributed to the development of advanced technologies in their industry.

Conclusion

Toshiaki Ichii's contributions to pressure sensor technology exemplify his dedication to innovation. His patent and work at Hokuriku Electric Industry Co., Ltd. highlight his role as a leading inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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