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For the Inventor, By the Inventor

Nara, Japan

Toshiaki Fukuyama

This inventor holds 9 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1995-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaki Fukuyama. Retrieved from https://idiyas.com/inventor/toshiaki-fukuyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9

% Patents Active = 77.8

Average Co-Inventor Count = 3.1

ph-index = 6

Forward Citations = 72(Granted Patents)


Company Filing History:

goldMedal9 out of 25,974 
 
Sharp Kabushiki Kaisha Corporation
 patents

Years Active: 1995-2010

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9 patents (USPTO):Explore Patents
1. 7811356 - Method of purifying metal (2010-10-12),
2. 7625541 - Method for purifying silicon and silicon (2009-12-01),
3. 5914758 - Liquid crystal display with non-linear switching elements having (1999-06-22),
4. 5909264 - LCD device having a switching element with reduced size and capacitance (1999-06-01),
5. 5719647 - Reflective type liquid crystal display apparatus having ESD protecting (1998-02-17),
6. 5654207 - Method of making two-terminal nonlinear device and liquid crystal (1997-08-05),
7. 5539549 - Active matrix substrate having island electrodes for making ohmic (1996-07-23),
8. 5521731 - Reflective type liquid crystal display device and method of making the (1996-05-28),
9. 5442224 - Two-terminal mim device having stable non-linearity characteristics and (1995-08-15),

Title: Toshiaki Fukuyama: Innovator in Metal Purification

Introduction

Toshiaki Fukuyama is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of metal purification, holding a total of 9 patents. His innovative methods have the potential to enhance the efficiency and cost-effectiveness of metal processing.

Latest Patents

Fukuyama's latest patents include a method of purifying metal, which focuses on efficiently eliminating impurity elements from various metallic or semiconductor materials, particularly metallurgical grade silicon. Another notable invention is a method for purifying silicon, which involves blowing a treating gas generated by reacting carbon with an oxidized gas into molten silicon. This method not only purifies silicon but also produces silicon as a byproduct. The oxidized gas used in this process can contain water vapor and hydrogen, showcasing Fukuyama's innovative approach to metal purification.

Career Highlights

Fukuyama is associated with Sharp Kabushiki Kaisha Corporation, where he has been able to apply his expertise in metal purification. His work has contributed to advancements in the field, making significant impacts on the industry.

Collaborations

Fukuyama has collaborated with notable coworkers such as Toshiyuki Yoshimizu and Yoshihisa Ishimoto. Their combined efforts have furthered research and development in metal purification technologies.

Conclusion

Toshiaki Fukuyama's contributions to metal purification through his innovative patents highlight his role as a key inventor in this field. His work continues to influence advancements in metal processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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