Osaka, Japan

Toru Sakaguchi

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Industrial Science and Technology. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Sakaguchi. Retrieved from https://idiyas.com/inventor/toru-sakaguchi-enqjnwvo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Toru Sakaguchi: Innovator in Nonlinear Optical Materials

Introduction

Toru Sakaguchi is a prominent inventor based in Osaka, Japan. He is known for his contributions to the field of nonlinear optical materials. His innovative work has led to the development of advanced materials that have significant applications in various technologies.

Latest Patents

Sakaguchi holds a patent for a third-order nonlinear optical material and the method for its production. This material features a metal oxide contained within a transparent polymer, which enhances its optical properties. His patent is a testament to his expertise and creativity in material science.

Career Highlights

Toru Sakaguchi is associated with the Industrial Science and Technology organization. His work there has focused on developing cutting-edge materials that push the boundaries of current technology. His dedication to research and innovation has made him a valuable asset in his field.

Collaborations

Sakaguchi has collaborated with notable colleagues, including Masanori Ando and Tetsuhiko Kobayashi. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Toru Sakaguchi's contributions to nonlinear optical materials exemplify the spirit of innovation. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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