Toru Murakami

Title: Toru Murakami: Innovator in Ion Implantation Technology

Introduction

Toru Murakami is a notable inventor based in Niihama, Japan. He has made significant contributions to the field of ion implantation technology, particularly through his innovative patent that enhances the efficiency of ion beam current control.

Latest Patents

Toru Murakami holds a patent for a "Method and system for operating a variable aperture in an ion implanter." This invention provides a system and method for adjusting the amount of ion beam current passing through a variable aperture in an ion implantation system. The process involves measuring the ion beam current at an implanter location, comparing it with a desired current, and outputting a control signal to adjust the aperture gap accordingly. This mechanism allows for quick and precise changes in ion beam current without the need for re-tuning the source. The adjustable gap of the aperture can be modified in increments of about 5 microns.

Career Highlights

Toru Murakami is currently employed at Axcelis Technologies, Inc., where he continues to develop and refine technologies related to ion implantation. His work has been instrumental in advancing the capabilities of ion implanters, which are critical in semiconductor manufacturing.

Collaborations

Throughout his career, Toru has collaborated with esteemed colleagues such as Paul A. Loomis and Hans J. Rutishauser. These collaborations have contributed to the development of innovative solutions in the field of ion implantation.

Conclusion

Toru Murakami's contributions to ion implantation technology through his patent and work at Axcelis Technologies, Inc. highlight his role as a key innovator in the industry. His advancements continue to influence the efficiency and precision of ion beam applications.