Kasukabe, Japan

Toru Endo

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi, Ltd., Toppan Printing Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Endo. Retrieved from https://idiyas.com/inventor/toru-endo-qppjlf90

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Toru Endo: Innovator in Anti-Forgery Technology

Introduction

Toru Endo is a notable inventor based in Kasukabe, Japan. He is recognized for his contributions to the field of anti-forgery technology, particularly through his innovative patent that addresses the prevention of forgery.

Latest Patents

Endo holds a patent for an IC label designed for the prevention of forgery. This invention includes a label substrate with an adhesive agent for affixing it to an object. It features a non-contact IC medium that contains an IC chip for storing predetermined identification information and an antenna for the wireless transmission of this information. Additionally, the label incorporates a security function that prevents replication, enhancing its effectiveness in combating forgery.

Career Highlights

Throughout his career, Toru Endo has worked with prominent companies such as Hitachi, Ltd. and Toppan Printing Co., Ltd. His experience in these organizations has contributed significantly to his expertise in technology and innovation.

Collaborations

Endo has collaborated with notable colleagues, including Kozue Furuichi and Manabu Suzuki. Their joint efforts have further advanced the development of innovative solutions in their respective fields.

Conclusion

Toru Endo's work in anti-forgery technology exemplifies the impact of innovation in enhancing security measures. His patent for the IC label represents a significant advancement in the fight against forgery, showcasing his dedication to creating effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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