Oslo, Norway

Torkil Storstein

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Torkil Storstein. Retrieved from https://idiyas.com/inventor/torkil-storstein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Torkil Storstein: Innovator in Friction Member Technology

Introduction

Torkil Storstein is a notable inventor based in Oslo, Norway. He has made significant contributions to the field of surface treatment technologies, particularly in the development of friction members.

Latest Patents

Torkil Storstein holds a patent for a "Friction member and a method for its surface treatment." This innovative method involves providing a friction member made of PMMC material. The process includes forming a transfer layer on the active surface of the friction member by removing the top layer of the matrix material to expose a surface embedded with reinforcing particles. This advancement enhances the performance and durability of friction members.

Career Highlights

Throughout his career, Torkil has focused on improving friction technologies. His work has led to the development of methods that optimize the performance of friction members, making them more effective in various applications.

Collaborations

Torkil has collaborated with notable professionals in his field, including Claes Kuylenstierna and Jouko Kalmi. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Torkil Storstein is a distinguished inventor whose work in friction member technology has made a significant impact. His innovative methods and collaborations continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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