Tooru Shibata

Title: Tooru Shibata: Innovator in Semiconductor Manufacturing

Introduction

Tooru Shibata is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Tooru Shibata holds a patent for a pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product. This method involves developing a resist film on a substrate's main surface by flowing a developing solution to create a resist pattern. The process includes partitioning the surface into multiple regions and determining correction exposure doses for each region to ensure that the actual pattern dimensions match the design specifications.

Career Highlights

Tooru Shibata is associated with Kabushiki Kaisha Toshiba, a leading company in technology and electronics. His work has been instrumental in advancing semiconductor manufacturing techniques.

Collaborations

Tooru has collaborated with notable colleagues, including Hideaki Sakurai and Masato Saito, who have contributed to his research and development efforts.

Conclusion

Tooru Shibata's innovative work in semiconductor manufacturing exemplifies the impact of dedicated inventors in advancing technology. His contributions continue to influence the industry and inspire future innovations.