Tooru Komatu

Title: Inventor Spotlight: Tooru Komatu from Yokosuka, JP

Introduction

Tooru Komatu is a prominent inventor based in Yokosuka, Japan, who has made significant contributions to the field of materials science. With a total of three patents to his name, Komatu's innovations highlight the intersection of technology and practical applications, particularly in sputtering target materials.

Latest Patents

Komatu's latest patents focus on advanced sputtered silicide films that enhance performance in thin film applications. One of his key inventions details a method where metal silicide grains are interconnected to form a robust metal silicide phase. This design results in silicon grains being strategically dispersed within the metal silicide phase, ensuring a high-density sputtering target with minimal carbon content (less than 100 ppm). This configuration not only reduces particle generation during the sputtering process but also prevents carbon from mixing into the thin films developed from the sputtering process.

Another notable patent elaborates on the manufacturing method of similar sputtering targets, reiterating the benefits of a high-density structure that minimizes imperfections and enhances overall material strength. Through these innovations, Komatu significantly contributes to the efficiency and quality of thin film technologies.

Career Highlights

Tooru Komatu is associated with Kabushiki Kaisha Toshiba, a leading electronics and technology company where his expertise in materials science has been pivotal in advancing their product offerings. His work encapsulates the innovation drive at Toshiba, leading to enhanced materials that push the boundaries of current technologies.

Collaborations

Throughout his career, Komatu has collaborated with esteemed colleagues Michio Satou and Takasi Yamanobe. Together, they have worked on various projects that leverage their combined expertise, further cementing the collaborative spirit that drives technological advancements in their field.

Conclusion

Tooru Komatu stands out as an influential inventor, showcasing remarkable ingenuity in the realm of sputtered silicide films. His patents not only mark milestones in his career but also contribute to the broader landscape of materials science, impacting industries reliant on high-performance sputtering targets. His work continues to be a testament to the innovative spirit that prevails at Kabushiki Kaisha Toshiba and beyond.