Company Filing History:
Years Active: 2008-2014
Title: The Innovative Contributions of Tony Schrock
Introduction
Tony Schrock is a notable inventor based in Boise, Idaho, recognized for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, Schrock has made strides in improving manufacturing processes that enhance the efficiency and effectiveness of electronic components.
Latest Patents
One of Schrock's latest patents is a method to reduce charge buildup during high aspect ratio contact etch. This innovative method involves high aspect ratio contact etching of a substantially vertical contact hole in an oxide layer using a hard photoresist mask. The oxide layer is deposited on an underlying substrate, and a plasma etching gas is formed from a carbon source gas. Dopants are mixed into the gas, allowing the doped plasma etching gas to etch a substantially vertical contact hole through the oxide layer. This process involves doping carbon chain polymers formed along the sidewalls of the contact holes into a conductive state. The conductive state of these polymers reduces charge buildup along the sidewalls, preventing twisting of the contact holes by bleeding off the charge and ensuring proper alignment with active area landing regions. The etching process stops at the underlying substrate, showcasing Schrock's innovative approach to semiconductor manufacturing.
Career Highlights
Tony Schrock has built a successful career at Micron Technology Incorporated, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's success but has also had a lasting impact on the industry as a whole.
Collaborations
Throughout his career, Schrock has collaborated with talented individuals such as Gurtej S Sandhu and Max F Hineman. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.
Conclusion
Tony Schrock's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry, paving the way for future advancements in electronic manufacturing.