Calgary, Canada

Tony C Wong

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Amerigo Technology Limited. Active years: 1985.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1985

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tony C Wong: Innovator in Siliceous Formation Treatment

Introduction

Tony C Wong is a notable inventor based in Calgary, Canada. He has made significant contributions to the field of chemical engineering, particularly in the treatment of siliceous formations. His innovative approach has led to the development of a unique composition that addresses challenges in this area.

Latest Patents

Tony C Wong holds a patent for a composition titled "H.sub.3 PO.sub.4 /HF Siliceous formation treating composition and method." This invention involves an aqueous solution with a phosphoric acid concentration ranging from about 10 to about 30% by weight. The solution is enhanced with at least one fluorine donor compound, generating hydrofluoric acid concentrations between about 1 to about 7% by weight. This composition is notably reactive towards clay and silica, while exhibiting significantly retarded reactivity towards calcium carbonate, distinguishing it from conventional mud acids. The preferred fluorine donor is ammonium bifluoride, and an effective phosphoric acid solution is a Turflo.RTM. solution, which further enhances calcium carbonate reactivity retardation.

Career Highlights

Tony C Wong is associated with Amerigo Technology Limited, where he applies his expertise in chemical formulations. His work focuses on developing innovative solutions that improve the efficiency and effectiveness of treatments for siliceous formations.

Conclusion

Tony C Wong's contributions to the field of chemical engineering, particularly through his patented invention, demonstrate his commitment to innovation. His work continues to influence the industry and offers promising solutions for siliceous formation treatment.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…