Tokyo, Japan

Tongoh Chin



Average Co-Inventor Count = 6.7

ph-index = 5

Forward Citations = 241(Granted Patents)


Location History:

  • Hino, JP (2008 - 2013)
  • Tokyo, JP (2013 - 2014)

Company Filing History:


Years Active: 2008-2014

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6 patents (USPTO):Explore Patents

Title: **The Innovative Genius of Tongoh Chin: Pioneering Respiratory Mask Technologies**

Introduction

Tongoh Chin, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of respiratory technology. With a total of six patents under his name, Chin is recognized for his innovations aimed at improving user comfort and efficacy in respiratory devices.

Latest Patents

Chin's latest patents showcase his ingenuity in developing advanced respiratory mask systems. One notable invention is a comprehensive **Respiratory Mask System** designed to minimize lateral slipping caused by head movement. This system features a mask cushion that covers the user's nose, mouth, or entire face, connected to a first frame for supplying respiratory gas under positive pressure. A second frame, linked to a headgear strap, facilitates the adjustable and stable positioning of the mask, ensuring effectiveness during use.

Additionally, his **Nasal Respiratory Mask System** offers a more specialized solution. It includes a nasal mask that fits snugly on the user’s face, allowing positive-pressure breathing gas to be delivered effectively. This system also features a unique headgear design that prevents twisting during use and simplifies disassembly for cleaning.

Career Highlights

Tongoh Chin has established his career at Teijin Pharma Limited, where he has been at the forefront of developing innovative healthcare solutions. His work emphasizes the intersection of technology and health, addressing critical needs in respiratory support and user comfort.

Collaborations

Throughout his career, Chin has collaborated with esteemed colleagues, including Keiko Omura and Masahide Takishita. Their combined expertise fosters a spirit of innovation, driving advancements in respiratory technologies that cater to diverse user requirements.

Conclusion

In summary, Tongoh Chin stands out as a leading inventor in the field of respiratory mask systems. His latest patents reflect a commitment to enhancing user experience and safety. With ongoing collaborations and a passion for innovation, Chin continues to pave the way for future advancements in healthcare technology.

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