The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Oct. 18, 2007
Masahide Takishita, Tokyo, JP;
Takamitsu Okayama, Tokyo, JP;
Keiko Omura, Tokyo, JP;
Tongoh Chin, Tokyo, JP;
Masahide Takishita, Tokyo, JP;
Takamitsu Okayama, Tokyo, JP;
Keiko Omura, Tokyo, JP;
Tongoh Chin, Tokyo, JP;
Teijin Pharma Limited, Tokyo, JP;
Abstract
A respiratory mask system is provided, in which while wearing a respiratory mask system, force generated by movement of a user's head and the like to induce laterally slipping a mask cushion may be reduced or absorbed. The respiratory mask system is provided with a mask cushion covering a nose, a nose and a mouth, or a full face. A first frame is connected with the mask cushion to supply respiratory gas under positive pressure. A second frame is connected with a headgear strap, in which the mask cushion is placed on a face side of the first frame and the first frame is placed on a face side of the second frame. The first frame is connected slidably with the second frame along a slide surface.