Company Filing History:
Years Active: 2006
Title: The Innovations of Tong Zheng
Introduction
Tong Zheng is an accomplished inventor based in Rockaway, NJ, known for his significant contributions to the field of optical metrology. He holds one patent that showcases his expertise in measuring the elastic moduli of dielectric thin films. His work is particularly relevant in the semiconductor industry, where precision and accuracy are paramount.
Latest Patents
Tong Zheng's patent, titled "Measuring elastic moduli of dielectric thin films using an optical metrology system," presents an innovative optical metrology system equipped with a data analysis method. This system is designed to determine the elastic moduli of optically transparent dielectric films, such as silicon dioxide and carbon-doped oxides, over metal or semiconductor substrates. The process involves measuring the index of refraction using an ellipsometer and analyzing the wavelength of a laser beam with a laser spectrometer. By directing a light pulse onto a wafer surface and measuring specific coordinates, Zheng calculates the angles of incidence and refraction, ultimately determining the sound velocity and bulk modulus. His system also includes hardware calibration to minimize result variations to about 0.5% or below.
Career Highlights
Tong Zheng is currently employed at Rudolph Technologies, Inc., where he applies his expertise in optical metrology. His work has been instrumental in advancing the technology used in the semiconductor industry. Zheng's innovative approach to measuring elastic moduli has positioned him as a key figure in his field.
Collaborations
Some of Tong Zheng's notable coworkers include Sean P. Leary and Guray Tas. Their collaborative efforts contribute to the ongoing advancements in optical metrology and related technologies.
Conclusion
Tong Zheng's contributions to the field of optical metrology through his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work not only enhances measurement accuracy but also sets a standard for future innovations in the field.