Ichinomiya, Japan

Tomoyuki Inaba

This inventor holds 1 USPTO granted patent. Top assignee: Kabushikikaisha Barudan. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoyuki Inaba. Retrieved from https://idiyas.com/inventor/tomoyuki-inaba-bm2kwaaf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Tomoyuki Inaba

Introduction

Tomoyuki Inaba is a notable inventor based in Ichinomiya, Japan. He has made significant contributions to the field of embroidery technology. His innovative approach has led to the development of a unique method for mending embroidery patterns.

Latest Patents

Inaba holds a patent for a "Method for mending an embroidery pattern." This invention addresses the issue of sequins dropping from embroidery patterns during the sewing process. The method involves determining if a sequin has fallen, stopping the embroidery machine, and retrieving a control signal to supply a new sequin. The embroidery machine is then returned to the appropriate position, allowing for the seamless continuation of the embroidery work.

Career Highlights

Tomoyuki Inaba is associated with Kabushikikaisha Barudan, a company known for its advanced embroidery machines. His work has contributed to enhancing the efficiency and quality of embroidery production. Inaba's innovative solutions have positioned him as a valuable asset in the industry.

Collaborations

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Conclusion

Tomoyuki Inaba's inventive spirit and dedication to improving embroidery technology have made a lasting impact in his field. His patent for mending embroidery patterns showcases his ability to solve practical problems in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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