Kanagawa, Japan

Tomonori Ohki

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomonori Ohki. Retrieved from https://idiyas.com/inventor/tomonori-ohki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Tomonori Ohki: Innovator in PDP Technology

Introduction

Tomonori Ohki is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of display technology, particularly in the development of methods for forming front electrodes in plasma display panels (PDP).

Latest Patents

Ohki holds a patent for a method for forming a PDP front electrode. This innovative method involves applying a specific type of photopolymerizable black paste, drying it, and then applying a particular type of photopolymerizable white paste on top of the dried black paste. This technique enhances the efficiency and performance of PDPs.

Career Highlights

Ohki is currently employed at E.I. du Pont de Nemours and Company, a leading company in the field of materials science. His work at this organization has allowed him to further his research and development efforts in display technologies.

Collaborations

Ohki has collaborated with Kazushige Ito, a fellow innovator in the field. Their partnership has contributed to advancements in PDP technology and has fostered a creative environment for innovation.

Conclusion

Tomonori Ohki's contributions to the field of plasma display technology through his innovative patent and collaboration with industry professionals highlight his role as a key inventor in this area. His work continues to influence advancements in display technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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