This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: The Innovations of Tomonori Hiramatsu
Introduction
Tomonori Hiramatsu is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of photosensitive resin compositions. His work focuses on developing materials that enhance image reproducibility while being environmentally friendly.
Latest Patents
Hiramatsu holds a patent for a photosensitive resin composition, which includes a photosensitive layer and a photosensitive resin printing original plate. This invention aims to create a composition that is easily developable with an aqueous developer, resistant to both aqueous and cosolvent inks, and ensures high-quality image reproduction. The composition consists of hydrophobic polymers derived from multiple water dispersion latexes, a photopolymerizable compound, and a photopolymerization initiator.
Career Highlights
Hiramatsu is associated with Toyo Boseki Kabushiki Kaisha, where he has been instrumental in advancing the company's research and development efforts. His innovative approach has led to the creation of materials that meet the demands of modern printing technologies.
Collaborations
Some of his notable coworkers include Toru Wada and Akira Tomita, who have collaborated with him on various projects within the company.
Conclusion
Tomonori Hiramatsu's contributions to the field of photosensitive resin compositions highlight his commitment to innovation and quality in material science. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile