Koshi, Japan

Tomonori Esaki

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2017-2025

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2 patents (USPTO):Explore Patents

Title: **Tomonori Esaki: Innovator in Substrate Processing**

Introduction

Tomonori Esaki is a notable inventor based in Koshi, Japan, recognized for his contributions to substrate processing technology. With a single patent to his name, Esaki's work emphasizes innovative methodologies that enhance efficiency in electronic manufacturing.

Latest Patents

Esaki's patent, titled "Substrate Processing Method, Storage Medium and Substrate Processing System," presents a cutting-edge technique that utilizes a block copolymer. The method involves coating the copolymer onto a substrate with a specified pattern, promoting phase separation into two distinct polymers. A key feature of this technology is the heating of the substrate in a low oxygen atmosphere, allowing for the selective removal of the first polymer, thereby optimizing the substrate’s properties for further applications.

Career Highlights

Currently, Tomonori Esaki works at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing sectors. His role involves leveraging his expertise in polymer science and substrate processing to drive advancements within the industry.

Collaborations

Esaki has collaborated with esteemed colleagues such as Shinichiro Kawakami and Takashi Yamauchi. Together, they combine their knowledge and skills to push the boundaries of substrate technology, contributing to the evolving landscape of electronic devices.

Conclusion

Tomonori Esaki’s innovative approach to substrate processing showcases the importance of creativity and technical skill in advancing electronic manufacturing. His patent not only adds value to Tokyo Electron Limited but also paves the way for future innovations in substrate technologies. The combined efforts of Esaki and his associates signify a commitment to excellence and progress in the field.

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