Ibaraki, Japan

Tomoko Ishikawa

USPTO Granted Patents = 5 


Average Co-Inventor Count = 6.8

ph-index = 2

Forward Citations = 72(Granted Patents)


Location History:

  • Tsukuba, JP (2014 - 2017)
  • Ibaraki, JP (2007 - 2019)

Company Filing History:


Years Active: 2007-2019

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5 patents (USPTO):Explore Patents

Title: **Celebrating the Innovations of Tomoko Ishikawa**

Introduction

Tomoko Ishikawa, an accomplished inventor based in Ibaraki, Japan, has made significant contributions to the field of materials science and engineering. With a remarkable portfolio of five patents, she is recognized for her pioneering inventions, which enhance the performance of metallic solutions and plating processes.

Latest Patents

Ishikawa's latest patents highlight her innovation in the realm of metal colloidal solutions. One of her notable inventions is a metal colloid solution that includes colloidal particles made from one or more metals and a protective agent that bonds to these particles. This solution is designed with specific chloride ion and nitrate ion concentration limits to enhance its adsorption performance. She has also developed a method for treating substrates that support catalyst particles for plating processing. This method enables improved micronization treatment of metal fine particles, facilitating the formation of stable plating layers on circuit patterns or through-silicon vias (TSVs).

Career Highlights

Throughout her career, Tomoko Ishikawa has collaborated with industry leaders such as Sumitomo Electric Industries Limited and the National Institute of Advanced Industrial Science and Technology. These experiences have allowed her to deepen her understanding of materials and advance her research in innovative solutions for electronic applications.

Collaborations

Ishikawa has had fruitful collaborations with esteemed colleagues, including Yuusuke Ohshima and Hitoshi Kubo. Working alongside these talented individuals has contributed to her success in developing cutting-edge technologies and expanding the boundaries of her research.

Conclusion

Tomoko Ishikawa exemplifies excellence in innovation with her significant contributions to the field of metal colloidal solutions and plating technology. Her continued dedication to research and development inspires future generations of inventors and reinforces the importance of innovation in advancing technology.

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