Kanagawa, Japan

Tomoki Horigome


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Kanagawa, JP (1991)
  • New York, NY (US) (1992)

Company Filing History:


Years Active: 1991-1992

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2 patents (USPTO):Explore Patents

Title: **The Innovations of Tomoki Horigome**

Introduction

Tomoki Horigome, an esteemed inventor based in Kanagawa, Japan, has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. With a total of two patents under his name, Horigome's work has the potential to revolutionize the manufacturing processes in electronics.

Latest Patents

Tomoki Horigome's latest patents showcase groundbreaking innovations in photosensitive resin compositions. The first patent focuses on a photosensitive resin composition that is useful as solder resist, etching resist, or plating resist in the manufacture of printed circuit boards. This invention exhibits excellent resistance to heat and chemicals, as well as strong adhesion to substrate surfaces. The composition primarily consists of a copolymeric resin derived from an α,β-unsaturated dicarboxylic acid anhydride and an ethylenically unsaturated polymerizable compound. Moreover, the resin's acid anhydride units are partially esterified with unsaturated and saturated alcohols, and it includes a photopolymerization initiator, with optional ingredients such as photopolymerizable monomers and epoxy-based resins.

The second patent, a heat-resistant photosensitive resin composition, comprises a ternary copolymer of ethylenically unsaturated amide, carboxyl-containing monomer, and a third monomer. This composition undergoes esterification with an unsaturated carboxylic acid and a novolactone-type epoxy resin, along with a photopolymerizable monomer and initiator. Notably, this resist layer can be developed using an alkaline aqueous solution, offering excellent heat resistance as well as other desirable properties after thermal curing resulting from pattern-wise exposure to ultraviolet light.

Career Highlights

Horigome has collaborated with prominent companies during his career, most notably Tokyo Ohka Kogyo Co., Ltd. His experience at this established firm has granted him valuable insights into the industry, further informing his innovative developments.

Collaborations

In his professional journey, Tomoki Horigome has worked alongside distinguished colleagues, including Kenji Tazawa and Akira Iwata. These collaborations have likely enriched his work and fostered an environment of shared creativity and innovation.

Conclusion

Tomoki Horigome stands out as a notable inventor whose patents in photosensitive resin compositions contribute significantly to advancements in electronic manufacturing technologies. His innovative spirit and collaborations with industry experts have paved the way for future enhancements in this field, promising to make a lasting impact on the industry.

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