Tomohiro Tamori

Title: Innovations of Tomohiro Tamori

Introduction

Tomohiro Tamori is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern measurement technology. With a total of four patents to his name, Tamori's work focuses on enhancing the precision of measurements in semiconductor manufacturing.

Latest Patents

Tamori's latest patents include a pattern measurement device and a pattern measurement method. This innovative computation device is designed to measure the dimensions of patterns formed on a sample using signals obtained from a charged particle beam device. The device features a positional deviation amount calculation unit that calculates the amount of positional deviation in a direction parallel to a wafer surface between two patterns of different heights. This calculation is based on images acquired at a specific beam tilt angle. Additionally, it includes a pattern inclination amount calculation unit that determines the amount of pattern inclination from the positional deviation. Furthermore, a beam tilt control amount calculation unit is incorporated to adjust the beam tilt angle to align with the calculated pattern inclination. The device then reacquires an image and measures the patterns accurately.

Career Highlights

Throughout his career, Tamori has worked with prominent companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in pattern measurement.

Collaborations

Some of Tamori's notable coworkers include Takuma Yamamoto and Hiroya Ohta. Their collaboration has contributed to the advancement of technology in their respective fields.

Conclusion

Tomohiro Tamori's contributions to pattern measurement technology demonstrate his expertise and innovative spirit. His patents reflect a commitment to improving measurement accuracy in semiconductor manufacturing.