This inventor holds 1 USPTO granted patent. Top assignee: Nippon Zeon Company, Ltd.. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Tomohiro Shibuya: Innovator in Photosensitive Elastomer Technology
Introduction
Tomohiro Shibuya is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive elastomer compositions.
Latest Patents
Shibuya holds a patent for a photosensitive elastomer composition and a photosensitive rubber plate. This innovation showcases his expertise in creating materials that respond to light, which can be utilized in various applications.
Career Highlights
Shibuya is currently employed at Nippon Zeon Company, Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the capabilities of elastomer materials.
Collaborations
Throughout his career, Shibuya has collaborated with talented individuals such as Takao Suzuki and Fusayoshi Sakurai. These partnerships have fostered innovation and contributed to the success of their projects.
Conclusion
Tomohiro Shibuya is a distinguished inventor whose work in photosensitive elastomer technology has made a lasting impact. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile