Kyoto, Japan

Tomohiro Sakai

This inventor holds 1 USPTO granted patent. Top assignee: Toyoda Gosei Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Sakai. Retrieved from https://idiyas.com/inventor/tomohiro-sakai-t57ljmr7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 4.0

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Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Tomohiro Sakai: Innovator in Electrode Technology

Introduction

Tomohiro Sakai is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of electrodes for silicon carbide (SiC) applications. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Sakai holds a patent for an electrode designed for p-type silicon carbide. This invention features a p-type electrode that includes a first electrode material exhibiting an eutectic reaction at a temperature of 600°C or lower, along with a second electrode material made of aluminum (Al). This advancement is crucial for enhancing the performance and efficiency of SiC devices.

Career Highlights

Throughout his career, Tomohiro Sakai has been associated with Toyoda Gosei Co., Ltd., a company known for its innovative solutions in the automotive and electronics sectors. His work at Toyoda Gosei has allowed him to focus on cutting-edge research and development in semiconductor materials.

Collaborations

Sakai has collaborated with talented colleagues, including Miki Moriyama and Masanori Murakami. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of technological advancements.

Conclusion

Tomohiro Sakai's contributions to electrode technology exemplify the spirit of innovation in the semiconductor industry. His patent for a p-type SiC electrode highlights his commitment to advancing technology and improving device performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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