Nirasaki, Japan

Tomohiro Oota

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Tomohiro Oota

Introduction

Tomohiro Oota is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of film forming technology. His work primarily focuses on enhancing the efficiency and effectiveness of film forming processes.

Latest Patents

Tomohiro Oota holds a patent for a film forming apparatus. This apparatus is designed to perform a film forming process by sequentially supplying a plurality of reactant gases to a substrate. It also includes a replacement gas supply system. The apparatus features a mounting table for the substrate and a shower head with a flat surface and multiple gas supply openings. An annular protrusion is integrated into the shower head to create a gap with the mounting table's top surface. Additionally, the design incorporates gas supply units positioned at the ceiling of the shower head, with gas discharge openings arranged circumferentially. The diffusion space is strategically located to optimize the film forming process.

Career Highlights

Tomohiro Oota is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to advancements in film forming technologies, which are crucial for various applications in electronics.

Collaborations

Throughout his career, Oota has collaborated with esteemed colleagues, including Tetsuya Saitou and Toshio Takagi. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Tomohiro Oota's contributions to the field of film forming technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and collaborative efforts continue to influence advancements in this critical area.

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