Saitama, Japan

Tomohiro Ogawa

This inventor holds 1 USPTO granted patent. Top assignee: Hoya Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Ogawa. Retrieved from https://idiyas.com/inventor/tomohiro-ogawa-jozz1inm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Tomohiro Ogawa: Innovator in Lens Coating Technology

Introduction

Tomohiro Ogawa is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of lens coating technology. His innovative approach has led to the development of a unique lens coating apparatus and method.

Latest Patents

Ogawa holds a patent for a lens coating apparatus and lens coating method. This invention involves a process where one side of a lens is held by a suction-holding member. The suction-holding member is moved by a mechanism while sequentially performing coating, drying, and curing processes in independently disposed receptacles. The suction force applied to the lens is controlled by a section that adjusts according to the receptacle's position.

Career Highlights

Tomohiro Ogawa is associated with Hoya Corporation, a leading company in optical products. His work has been instrumental in advancing lens technology, enhancing the quality and efficiency of lens production.

Collaborations

Ogawa has collaborated with notable colleagues such as Katsuaki Uchida and Kenichi Shinde. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Tomohiro Ogawa's innovative contributions to lens coating technology exemplify the impact of dedicated inventors in the field. His patent and work at Hoya Corporation continue to influence advancements in optical technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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