Tomohiro Motono

Title: Tomohiro Motono: Innovator in Substrate Processing Technology

Introduction

Tomohiro Motono is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding 2 patents that showcase his innovative approach to technology. His work focuses on improving the efficiency and effectiveness of substrate processing apparatuses and methods.

Latest Patents

Motono's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features a support tray designed to trap residual liquid between the substrate and the support tray's surface in a groove. This design includes a discharge part that effectively prevents backflow of the residual liquid, thereby avoiding re-adhesion to the substrate's upper surface. His exposure device patent describes a cylindrical peripheral wall member that creates a processing space for substrates. This device incorporates a light emitter and a movable lower lid member, allowing for the replacement of the atmosphere with inert gas while exposing the substrate to vacuum ultraviolet rays.

Career Highlights

Motono is associated with Screen Holdings Co., Ltd., a company known for its advancements in semiconductor manufacturing equipment. His work has been instrumental in enhancing substrate processing techniques, contributing to the overall efficiency of production processes in the industry.

Collaborations

Motono has collaborated with notable colleagues, including You Arisawa and Masaya Asai. Their combined expertise has fostered innovation and development in substrate processing technologies.

Conclusion

Tomohiro Motono's contributions to substrate processing technology reflect his dedication to innovation and improvement in the field. His patents demonstrate a commitment to solving complex challenges in substrate processing, making him a valuable figure in the industry.