Ibaraki, Japan

Tomohiro Hattori

This inventor holds 2 USPTO granted patents. Top assignee: Nitto-Denko Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Hattori. Retrieved from https://idiyas.com/inventor/tomohiro-hattori-madbhfct

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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2 patents (USPTO):Explore Patents

Title: Tomohiro Hattori: Innovator in Photomask Alignment and PCB Manufacturing

Introduction

Tomohiro Hattori is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the fields of photomask alignment and printed circuit board (PCB) manufacturing. With a total of 2 patents, Hattori's work showcases his expertise and innovative spirit.

Latest Patents

Hattori's latest patents include a "Method of aligning photomask with base material" and a "Method of manufacturing printed circuit board." The exposure system described in his first patent features an exposure device equipped with multiple cameras. Each camera can operate in either a full scan mode or a partial scan mode. In full scan mode, the camera transmits all obtained image data, while in partial scan mode, it selectively extracts and transmits only part of the image data. The accompanying image processing device performs processing using both sets of data.

His second patent, "Method of detecting alignment mark and method of manufacturing printed circuit board," addresses the challenge of locating alignment marks. When an alignment mark is absent from the camera's imaging area, the system calculates its coordinates based on an identification mark present in the image. It then determines the necessary distance to move the base material to position the alignment mark within the camera's view.

Career Highlights

Hattori is currently employed at Nitto-Denko Corporation, where he continues to develop innovative solutions in his field. His work has been instrumental in advancing technologies related to photomask alignment and PCB manufacturing.

Collaborations

Hattori collaborates with talented coworkers, including Shuuhei Miyazaki and Kousuke Murakami. Their combined expertise fosters a creative environment that drives innovation.

Conclusion

Tomohiro Hattori's contributions to the fields of photomask alignment and PCB manufacturing highlight his role as a leading inventor. His patents reflect a commitment to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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