Location History:
- Nakayama, JP (2022)
- Wakayama, JP (2015 - 2024)
Company Filing History:
Years Active: 2015-2025
Title: The Innovative Contributions of Tomohide Yoshida
Introduction
Tomohide Yoshida is a prominent inventor based in Wakayama, Japan. He has made significant contributions to the field of materials science, particularly in the development of fine metal particle dispersions and electrically conductive members. With a total of 11 patents to his name, Yoshida's work has had a substantial impact on various industries.
Latest Patents
Yoshida's latest patents include a fine metal particle dispersion production method. This invention relates to a process for producing a metal fine particle dispersion containing metal fine particles dispersed with a polymer. The process involves mixing a metal oxide, a polymer with a hydrophilic group, and a dihydric alcohol compound. The resulting metal fine particles have a cumulant average particle size of not more than 50 nm. Another notable patent is a method for manufacturing an electrically conductive member. This method includes applying an electrically conductive ink containing a metal fine particle dispersion to a substrate, forming electrically conductive images under ordinary-temperature environments.
Career Highlights
Throughout his career, Tomohide Yoshida has worked with notable companies such as Kao Corporation and Mitsubishi Chemical Corporation. His experience in these organizations has allowed him to refine his expertise in materials science and innovation.
Collaborations
Yoshida has collaborated with talented individuals in his field, including Kosuke Muto and Hiroyuki Kaneko. These collaborations have contributed to the advancement of his research and the successful development of his inventions.
Conclusion
Tomohide Yoshida's innovative work in fine metal particle dispersions and electrically conductive members showcases his significant contributions to materials science. His patents reflect a commitment to advancing technology and improving industrial applications.