Company Filing History:
3 out of 27 
2 out of 52 
Years Active: 2015-2018
Title: Tomio Kudo: Innovator in Conductive Film Technology
Introduction
Tomio Kudo is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of conductive film technology, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and effectiveness of conductive films, particularly through innovative sintering techniques.
Latest Patents
Kudo's latest patents include a conductive film forming method and a sintering promoter. The conductive film forming method utilizes photo sintering to create a conductive film with low electric resistance. This method involves several steps, including forming a liquid film made of a copper particulate dispersion on a substrate, drying the liquid film to create a copper particulate layer, and then subjecting this layer to photo sintering. The addition of a sintering promoter, which removes copper oxide from metallic copper, further enhances the conductivity of the film. Another patent focuses on a copper particulate dispersion that includes copper particulates, a dispersion vehicle, and a dispersant, ensuring that the copper particulates are effectively dispersed for optimal performance.
Career Highlights
Throughout his career, Tomio Kudo has worked with prominent companies such as Ishihara Chemical Co., Ltd. and Applied Nanotech Holdings, Inc. His experience in these organizations has allowed him to refine his expertise in nanotechnology and conductive materials.
Collaborations
Kudo has collaborated with talented individuals in his field, including Yuichi Kawato and Yusuke Maeda. These partnerships have contributed to the advancement of his innovative projects and patents.
Conclusion
Tomio Kudo's work in conductive film technology exemplifies the impact of innovation in modern materials science. His patents reflect a commitment to enhancing the functionality of conductive films, paving the way for future advancements in the industry.