Kanagawa, Japan

Tomihiro Takahashi

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomihiro Takahashi. Retrieved from https://idiyas.com/inventor/tomihiro-takahashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Tomihiro Takahashi: Innovator in Polishing Technology

Introduction

Tomihiro Takahashi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of polishing technology. His innovative approach has led to the development of a unique polishing sheet that enhances the efficiency of polishing processes.

Latest Patents

Takahashi holds a patent for a polishing sheet, polishing tool, and polishing method. This patent includes a sheet with a surface featuring a plurality of convex portions that project from one side. Each convex portion is equipped with first abrasive grains on its upper surface, while the sheet itself contains second abrasive grains that possess a hardness greater than that of the first abrasive grains. This innovative design allows for improved polishing performance.

Career Highlights

Takahashi is currently employed at Ricoh Company, Ltd., where he continues to develop and refine his inventions. His work at Ricoh has positioned him as a key player in the advancement of polishing technologies.

Collaborations

Some of his coworkers include Kiyotaka Sawada and Jun Zhang, who contribute to the innovative environment at Ricoh. Their collaboration fosters a culture of creativity and technological advancement.

Conclusion

Tomihiro Takahashi's contributions to polishing technology exemplify the impact of innovation in industrial applications. His patent reflects a commitment to enhancing product performance and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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