Poznań, Poland

Tomasz Rudny

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomasz Rudny. Retrieved from https://idiyas.com/inventor/tomasz-rudny

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations by Tomasz Rudny

Introduction

Tomasz Rudny is a notable inventor based in Poznan, Poland. He has made significant contributions to the field of digital content analysis. His innovative approach has led to the development of a unique method for generating photo-stories.

Latest Patents

Tomasz holds a patent for a "Method and apparatus for generating photo-story based on visual context analysis of digital content." This method involves generating tags that indicate properties of the context of photo images. It also includes predicting scenes indicated by the photo images based on the generated tags. Finally, it generates a photo-story that combines the predicted scenes.

Career Highlights

Tomasz is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology and innovation. His work has been instrumental in enhancing the way digital content is processed and presented.

Collaborations

Some of his notable coworkers include Adam Porecki and Andrzej Ruta. Their collaboration has fostered a creative environment that encourages innovative solutions in technology.

Conclusion

Tomasz Rudny's contributions to the field of digital content analysis exemplify the spirit of innovation. His patent and work at Samsung Electronics Co., Ltd. highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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