Sosnowiec, Poland

Tomasz P Cieszyński


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: Innovations of Tomasz P Cieszyński

Introduction

Tomasz P Cieszyński is a notable inventor based in Sosnowiec, Poland. He has made significant contributions to the field of three-dimensional printing technology. With a total of two patents to his name, Cieszyński's work focuses on innovative methods for forming three-dimensional articles.

Latest Patents

Cieszyński's latest patents include a method for forming a three-dimensional article by fusion of a powdered medium in a powder bed. This method involves distributing a powdered medium in a powder bed, heating it to a temperature below its melting point, and fusing it using a laser beam. The laser beam is projected in the form of an image of a cross-section of the three-dimensional article. The image of the cross-sectional layer is created through spatial light modulation of the laser beam using an LCoS display. During the fabrication process, the characteristics of the image of the cross-sectional layer are controlled by monitoring the projection of a holographic representation of the image using one or more imaging devices.

Career Highlights

Throughout his career, Cieszyński has worked with several companies, including Nexa3D Inc. and Nxt Factory Inc. His experience in these organizations has contributed to his expertise in the field of additive manufacturing and three-dimensional printing technologies.

Collaborations

Cieszyński has collaborated with notable individuals such as Jakub Graczyk and Avi N Reichental. These collaborations have further enhanced his innovative capabilities and expanded his professional network.

Conclusion

Tomasz P Cieszyński is a prominent inventor whose work in three-dimensional printing technology has led to significant advancements in the field. His innovative methods and collaborations highlight his contributions to modern manufacturing techniques.

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