Company Filing History:
Years Active: 2024
Title: Innovations of Tomas Polakovic in Thin Film Technology.
Introduction
Tomas Polakovic is an accomplished inventor based in Chicago, IL. He has made significant contributions to the field of thin film technology. His innovative methods have the potential to impact various industries, including electronics and materials science.
Latest Patents
Tomas holds a patent for a method of making thin films. This method involves bombarding a substrate with first ions supplied from a first ion beam. It also includes sputtering from a metal sputtering target substantially simultaneously with the bombardment. This process allows for the deposition of a metal-ion film onto the substrate without the application of heat. The metal sputtering target can comprise one or more metals, transition metals, semi-metals, alloys, and combinations thereof. He has 1 patent to his name.
Career Highlights
Tomas Polakovic is currently employed at the University of Chicago Argonne, LLC. His work at this prestigious institution allows him to collaborate with leading researchers and contribute to groundbreaking projects in thin film technology.
Collaborations
Tomas has worked alongside his coworker, Valentine Novosad, who shares a commitment to advancing research in their field. Their collaboration has fostered an environment of innovation and creativity.
Conclusion
Tomas Polakovic's contributions to thin film technology exemplify the spirit of innovation. His patented methods and collaborative efforts position him as a notable figure in the field.